DocumentCode
771150
Title
Numerical simulations of the reditron
Author
Kwan, Thomas J T ; Davis, Harold A.
Author_Institution
Los Alamos Nat. Lab., NM, USA
Volume
16
Issue
2
fYear
1988
fDate
4/1/1988 12:00:00 AM
Firstpage
185
Lastpage
191
Abstract
The reflected-electrons discrimination microwave generator (reditron) is a high-power, narrow-band, and single-mode microwave generator that makes exclusive use of the oscillatory character of the virtual-cathode of a relativistic electron beam. The complex, nonlinear character of the virtual-cathode device necessitates particle-in-cell plasma simulation techniques. Investigations indicate two sources of the radiation: (1) the trapped electrons reflexing between the real and virtual cathodes, and (2) the oscillation of the virtual cathode. In the conventional design, the two mechanisms coexist and interfere with each other destructively, causing degradation of the efficiency of microwave generation. The authors have investigated a configuration with a slotted, thick anode and an external magnetic field, which effectively eliminates the reflexing electrons. Two-dimensional particle-in-cell simulations showed that such a configuration exploits the oscillation of the virtual cathode exclusively, and it generates single-mode, narrow bandwidth, and high-power microwave radiation with a potential efficiency over 10%. It was found that further optimization could be achieved by the use of a density (current) modulated electron beam at appropriate frequencies
Keywords
microwave generation; microwave oscillators; relativistic electron beam tubes; external magnetic field; oscillation; particle-in-cell plasma simulation techniques; reditron; reflected-electrons discrimination microwave generator; reflexing electrons; relativistic electron beam; slotted, thick anode; virtual-cathode; Cathodes; Character generation; Electron beams; Electron traps; High power microwave generation; Microwave devices; Microwave generation; Narrowband; Numerical simulation; Plasma simulation;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.3813
Filename
3813
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