Iron Oxide Sputtered Films with Perpendicular Anisotropy

Perpendicular magnetized sputtered iron oxide film was fabricated. At a substrate temperature of 205°C, the sputtered film was in-plane magnetized, but perpendicular magnetic anisotropy was induced at 176°C. A perpendicular magnetized film was obtained at an oxygen partial pressure of 0.18mTorr over a rather wide substrate temperature range. In the x-ray diffraction pattern there were several unclear Fe3O4 and Fe2O3 peaks which could not be precisely determined.