• DocumentCode
    772777
  • Title

    Radiation Damage in Lithium Drifted p-i-n Junctions

  • Author

    Coleman, J.A. ; Rodgers, J.W.

  • Author_Institution
    Bell Telephone Laboratories, Incorporated Murray Hill, New Jersey
  • Volume
    11
  • Issue
    3
  • fYear
    1964
  • fDate
    6/1/1964 12:00:00 AM
  • Firstpage
    213
  • Lastpage
    220
  • Abstract
    A major effect of radiation damage of semiconductor junction detectors is the decrease of charge carrier lifetime. The thick depletion regions and low fields usually employed in p-i-n junctions makes them particularly sensitive to radiation damage. A study of the changes of electron trapping lengths in silicon p-i-n junctions as a function of radiation damage by Co60 gamma rays is presented. Significant changes of collection efficiency and collection time were observed at doses (~105R) which are considered negligible for damage in p-n junctions. The variations of reverse current and noise were small for these low doses. A method of fabrication and encapsulation of p-i-n junction radiation detectors is described which utilizes ion drifting from a localized source of lithium and a gold-silicon alloy seal.
  • Keywords
    Charge carrier lifetime; Electron traps; Fabrication; Gamma rays; Lithium; P-n junctions; PIN photodiodes; Semiconductor counters; Semiconductor device noise; Silicon;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1964.4323425
  • Filename
    4323425