High silica waveguides on alumina substrates for hybrid optoelectronic integration

Author

Sun, C.J. ; Myers, W.M. ; Schmidt, K.M. ; Sumida, S. ; Jackson, K.P.

Author_Institution

Photonic Integration Res. Inc., Columbus, OH, USA

Volume

4

Issue

6

fYear

1992

fDate

6/1/1992 12:00:00 AM

Firstpage

630

Lastpage

632

Abstract

High-silica optical waveguides are fabricated on alumina substrates by flame hydrolysis deposition (FHD) and reactive ion etching (RIE) patterning techniques. The composition of the high-silica glass waveguides is adjusted from that of the conventional FHD glass to reduce the thermal expansion mismatch between silica glass and alumina. Glass waveguides made in this way exhibit low loss and are compatible with various types of alumina ceramic substrates.<>

Keywords

chemical vapour deposition; hybrid integrated circuits; integrated optics; integrated optoelectronics; optical glass; optical losses; optical waveguides; optical workshop techniques; sputter etching; Al/sub 2/O/sub 3/; alumina substrates; ceramic substrates; composition; flame hydrolysis deposition; high silica optical waveguides; hybrid optoelectronic integration; low loss; reactive ion etching; silica glass; thermal expansion mismatch; Electronics packaging; Glass; High speed optical techniques; Optical devices; Optical films; Optical waveguides; Silicon compounds; Substrates; Sun; Thermal stresses;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.141991

Filename

141991