Title :
Low-loss planar optical waveguides fabricated in SIMOX material
Author :
Rickman, A. ; Reed, G.T. ; Weiss, B.L. ; Namavar, F.
Author_Institution :
Dept. of Electron. & Electr. Eng., Surrey Univ., Guildford, UK
fDate :
6/1/1992 12:00:00 AM
Abstract :
Planar optical waveguides have been formed in SIMOX structures, and the effect of the thickness of the buried oxide layer on propagation loss hs been studied. Waveguides with a guiding layer thickness of approximately 6 mu m have been measured, and the lowest loss, which is on the order of that of pure silicon, was observed for a buried oxide thickness of 0.4 mu m, at a measurement wavelength of 1.523 mu m.<>
Keywords :
integrated optics; ion implantation; optical losses; optical waveguides; optical workshop techniques; 0.4 micron; 1.523 micron; 6 micron; IR; SIMOX material; buried oxide layer; guiding layer thickness; low-loss planar optical waveguides; measurement wavelength; propagation loss; separation by implantation of oxygen; Loss measurement; Optical losses; Optical materials; Optical planar waveguides; Optical waveguides; Planar waveguides; Propagation losses; Silicon; Thickness measurement; Wavelength measurement;
Journal_Title :
Photonics Technology Letters, IEEE
