DocumentCode
773408
Title
Low-loss planar optical waveguides fabricated in SIMOX material
Author
Rickman, A. ; Reed, G.T. ; Weiss, B.L. ; Namavar, F.
Author_Institution
Dept. of Electron. & Electr. Eng., Surrey Univ., Guildford, UK
Volume
4
Issue
6
fYear
1992
fDate
6/1/1992 12:00:00 AM
Firstpage
633
Lastpage
635
Abstract
Planar optical waveguides have been formed in SIMOX structures, and the effect of the thickness of the buried oxide layer on propagation loss hs been studied. Waveguides with a guiding layer thickness of approximately 6 mu m have been measured, and the lowest loss, which is on the order of that of pure silicon, was observed for a buried oxide thickness of 0.4 mu m, at a measurement wavelength of 1.523 mu m.<>
Keywords
integrated optics; ion implantation; optical losses; optical waveguides; optical workshop techniques; 0.4 micron; 1.523 micron; 6 micron; IR; SIMOX material; buried oxide layer; guiding layer thickness; low-loss planar optical waveguides; measurement wavelength; propagation loss; separation by implantation of oxygen; Loss measurement; Optical losses; Optical materials; Optical planar waveguides; Optical waveguides; Planar waveguides; Propagation losses; Silicon; Thickness measurement; Wavelength measurement;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.141992
Filename
141992
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