Title :
Microfabrication techniques and applications
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
Abstract :
The impact of advances in integrated circuit fabrication techniques on other microtechnologies is examined. The key techniques, photolithography and etching, are discussed. Applications of these techniques to the fabrication of diffraction gratings, thin windows, and photoresist molds for electroplating are described.<>
Keywords :
diffraction gratings; electroplating; etching; integrated circuit technology; optical materials; photolithography; diffraction gratings; electroplating; etching; integrated circuit fabrication techniques; microtechnologies; photolithography; photoresist moulds; thin windows; Application specific integrated circuits; Chemical vapor deposition; Electronic components; Fabrication; Integrated circuit technology; Resists; Semiconductor devices; Silicon; Sputter etching; Substrates;
Journal_Title :
Potentials, IEEE
