DocumentCode
774882
Title
A novel frequency-multiplication device based on three-terminal ballistic junction
Author
Shorubalko, I. ; Xu, H.Q. ; Maximov, I. ; Nilsson, D. ; Omling, P. ; Samuelson, L. ; Seifert, W.
Author_Institution
Dept. of Solid State Phys., Lund Univ., Sweden
Volume
23
Issue
7
fYear
2002
fDate
7/1/2002 12:00:00 AM
Firstpage
377
Lastpage
379
Abstract
In this letter, a novel frequency-multiplication device based on a three-terminal ballistic junction is proposed and demonstrated. A 100 nm-size, three-terminal ballistic junction and a one-dimensional (1D), lateral-field-effect transistor with trench gate-channel insulation are fabricated from high-electron-mobility GaInAs/InP quantum-well material as a single device. The devices show frequency doubling and gain at room temperature. The performance of these devices up to room temperature originates from the nature of the device functionality and the fact that the three-terminal device extensions are maintained below the carrier mean-free path. Furthermore, it is expected that the device performance can be extended up to THz-range.
Keywords
III-V semiconductors; frequency multipliers; gallium arsenide; high electron mobility transistors; high field effects; indium compounds; isolation technology; quantum well devices; 100 nm; GaInAs-InP; GaInAs/InP; carrier mean-free path; device functionality; frequency doubling; frequency-multiplication device; high-electron-mobility quantum-well material; one-dimensional lateral-field-effect transistor; three-terminal ballistic junction; trench gate-channel insulation; Atomic force microscopy; Electric variables measurement; Fabrication; Frequency; Indium phosphide; Insulation; Physics; Scanning electron microscopy; Temperature measurement; Voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2002.1015202
Filename
1015202
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