Title :
In situ catalyzation of carbon nanostructures growth in low-frequency inductively coupled plasmas
Author :
Long, J.D. ; Xu, S. ; Huang, S.Y. ; Rutkevych, P.P. ; Xu, M. ; Diong, C.H.
Author_Institution :
Plasma Sources & Applic. Centre, Nanyang Technol. Univ., Singapore
fDate :
4/1/2005 12:00:00 AM
Abstract :
A low-frequency inductively coupled plasma source has been employed for in situ catalyzed growth of carbon nanostructures. The catalyzing process depends strongly on the plasma parameters and controls the shape and alignment of nanostructures.
Keywords :
carbon; catalysis; nanostructured materials; plasma chemistry; plasma materials processing; plasma sources; C; carbon nanostructures; catalyzation; low-frequency inductively coupled plasmas; plasma source; Argon; Carbon dioxide; Nanostructures; Nickel; Plasma applications; Plasma displays; Plasma sources; Plasma temperature; Radio frequency; Sputtering; Carbon nanostructure; in situ catalyzation; inductively coupled plasma;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2005.845340
