Title :
Discharge in dual magnetron sputtering system
Author :
Musil, Jindrich ; Baroch, Pavel
Author_Institution :
Dept. of Phys., Univ. of West Bohemia, Plzen, Czech Republic
fDate :
4/1/2005 12:00:00 AM
Abstract :
A dual magnetron sputtering system represents a very effective tool, particularly for reactive magnetron sputtering of insulated thin films. For an efficient deposition process, however, it is very important to optimize the electrical and magnetic field of the magnetron. Images of plasma discharges in different magnetic field configurations of the dual magnetron are presented.
Keywords :
high-frequency discharges; plasma confinement; plasma diagnostics; plasma materials processing; sputter deposition; deposition; dual magnetron sputtering system; electric field optimization; insulated thin films; magnetic field optimization; plasma discharges; reactive magnetron sputtering; Cathodes; Delta modulation; Geometry; Magnetic confinement; Magnetic fields; Magnetic switching; Magnets; Mirrors; Plasma confinement; Sputtering; Dual magnetron; magnetic field confinement; plasma discharge;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2005.844996
