Title :
Increase of Ar+ ion density in argon RF magnetron discharges caused by the addition of a small amount of oxygen
Author :
Yonemura, Shigeru ; Nanbu, Kenichi
Author_Institution :
Inst. of Fluid Sci., Tohoku Univ., Sendai, Japan
fDate :
4/1/2005 12:00:00 AM
Abstract :
Particle-in-cell/Monte Carlo (PIC/MC) simulations were performed for radio frequency (RF) planar magnetron discharges of pure argon gas and an O2-Ar gas mixture. The number densities of Ar+ and O- ions drastically increased when oxygen was added to the Ar discharge gas. Moreover, the spatial distributions of positive ions, Ar+, O2+, and O+, had two peaks in the O2/Ar mixture discharge. The positive ions were distributed in such a way that the charge neutrality was kept in the plasma bulk, indicating that the behavior of Ar+ ions is influenced by the existence of O-ions. The mechanism of this phenomenon is clearly explained by visualizing results of the simulation.
Keywords :
Monte Carlo methods; argon; gas mixtures; high-frequency discharges; oxygen; plasma density; plasma simulation; Ar+ ion density; Monte Carlo simulations; O2-Ar; O2-Ar gas mixture; argon RF magnetron discharges; charge neutrality; number densities; oxygen; particle-in-cell simulations; pure argon gas; radio frequency planar magnetron discharges; spatial positive ion distributions; Argon; Computational modeling; Electrodes; Electrons; Magnets; Monte Carlo methods; Oxygen; Plasma simulation; Radio frequency; Sputtering; Magnetron discharge; oxygen/argon mixture; particle-in-cell/Monte Carlo (PIC/MC) simulation; radio frequency (RF);
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2005.845067