Title :
Simulation of ion beam transport in an ion gun for materials processing
Author :
Kim, Sung Jin ; Wang, Soon Jung ; Lee, Jae Koo ; Yeom, Geun Young
Author_Institution :
Dept. of Electron. & Electr. Eng., Pohang Univ. of Sci. & Technol., South Korea
fDate :
4/1/2005 12:00:00 AM
Abstract :
Ion guns with several grids, which control ion energy from a plasma source, are widely used in semiconductor manufacturing process. We report on particle-in-cell simulations of the ion gun to which an electron beam and a magnetic field are applied in order to obtain higher ion fluxes. The electron beam in the energy range from 100 to 1000 eV is emitted in axial direction and the uniform magnetic field of 100 G perpendicular to the electron beam is used. It is revealed from the simulations that an ion flux in the ion gun with the electron beam and the magnetic field is twice larger than that in the conventional ion guns.
Keywords :
plasma guns; plasma materials processing; plasma simulation; plasma sources; plasma-beam interactions; 100 G; 100 to 1000 eV; electron beam; ion beam transport; ion energy; ion flux; ion gun; materials processing; particle-in-cell simulations; plasma source; semiconductor manufacturing process; uniform magnetic field; Apertures; Electron beams; Ion beams; Magnetic fields; Materials processing; Plasma applications; Plasma materials processing; Plasma simulation; Plasma sources; Voltage; Electron beam; ion gun; magnetized plasma; particle-in-cell simulation;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2005.845138
