Author_Institution :
Sch. of Opt. & Electron. Inf., Huazhong Univ. of Sci. & Technol., Wuhan, China
Abstract :
In this paper, an N-buffer layer has been introduced into the reversely switched dynistor (RSD). The relationship between the buffer layer and the device characteristics, together with the interaction among structural parameters, is discussed by the orthogonal method in detail. Based on the simulation results, buffer thickness Wn-buffer and buffer concentration Nn-buffer, N+ emitter concentration Nn+, and P+ emitter concentration Np+ at anode can all affect the maximum turn-ON voltage UFmax on the RSD. Furthermore, the UFmax increases with increasing Wn-buffer or decreasing Np+, and if Nn-buffer becomes higher continuously, the UFmax slightly decreases first, and then dramatically goes up. Besides, the interaction between Nn-buffer and Wn-buffer has a dramatic impact on the UFmax. When Nn-buffer = 1E17 cm-3, Wn-buffer = 10 μm, Np+ = 1E18 cm-3, and Nn+ = 1E20 cm-3, UFmax reaches its minimum in all the simulations. The experimental results verify the device characteristic´s improvement by introducing the buffer layer.
Keywords :
anodes; buffer layers; power semiconductor switches; semiconductor device models; N-buffer layer; RSD; buffer concentration; buffer thickness; emitter concentration; orthogonal method; reversely switched dynistor; switching characteristics; Anodes; Buffer layers; Doping; Mathematical model; Optical switches; Semiconductor process modeling; Buffer layer; maximum turn-ON voltage; orthogonal method; pulsed power switch; reversely switched dynistor (RSD); reversely switched dynistor (RSD).;