• DocumentCode
    777308
  • Title

    Eighteen-beam gun design for high power, high repetition rate, broadband multiple-beam klystrons

  • Author

    Nguyen, Khanh T. ; Pershing, Dean E. ; Abe, David K. ; Miram, George ; Levush, Baruch

  • Author_Institution
    Beam Wave Res. Inc., Silver Spring, MD, USA
  • Volume
    33
  • Issue
    2
  • fYear
    2005
  • fDate
    4/1/2005 12:00:00 AM
  • Firstpage
    685
  • Lastpage
    695
  • Abstract
    This paper presents the design of a high repetition rate electron gun to be employed in future high-power broadband multiple-beam amplifiers operating in S-band. Special emphasis is placed on the geometric layout of the gun to ensure high repetition rate operation at moderate beam switching voltages, good beam optics, and optimal beam packing for long life, efficient beam-wave interaction and broad bandwidth. The resulting gun design employs an eighteen-beam magnetically shielded cathode topology capable of generating a total current of 41.6 A (evenly divided among eighteen beams) at a voltage of 42 kV. In the beam tunnels, each beamlet has a radial fill factor of 48%. The nominal beam modulation voltage is 5.2 kV. With an estimated gun capacitance of 150 pF, a repetition rate in excess of 10 kHz is feasible with the current state-of-the-art in modulator technology.
  • Keywords
    cathodes; electron guns; klystrons; modulators; wideband amplifiers; 150 pF; 41.6 A; 42 kV; 5.2 kV; S-band; beam optics; beam packing; beam switching; beam tunnels; beam-wave interaction; broad bandwidth; broadband multiple-beam klystrons; eighteen-beam gun; gun capacitance; high repetition rate electron gun; magnetically shielded cathode; modulator technology; multiple-beam amplifiers; nominal beam modulation; radial fill factor; Bandwidth; Broadband amplifiers; Electron optics; Geometrical optics; High power amplifiers; Klystrons; Optical amplifiers; Optical beams; Stimulated emission; Voltage; Electron gun; multibeam; multiple-beam amplifier (MBA); multiple-beam klystron (MBK);
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2005.844523
  • Filename
    1420608