Planar and Channel Waveguide Structures in CdS Crystals at 633 and 1539 nm

Author

Tao Liu ; Peng Liu ; Lian Zhang ; Yu-Fan Zhou ; Xiao-Fei Yu ; Qing Huang ; Qing-ming Lu ; Xue-Lin Wang

Author_Institution

State Key Lab. of Crystal Mater., Shandong Univ., Jinan, China

Volume

32

Issue

14

fYear

2014

fDate

July15, 15 2014

Firstpage

2556

Lastpage

2559

Abstract

We report on the fabrication and optical properties of planar and channel waveguides in a CdS crystal using a C ion implantation technique combined with a standard photolithographic technique. The prism-coupling and the end-face coupling methods separately measure the guiding modes and the near-field intensity distribution of the light at 633 and 1539 nm. The refractive index profiles of the planar and channel waveguides are reconstructed at 633 and 1539 nm. The finite difference beam propagation method is used to simulate the guided mode profiles. There is excellent agreement between the measured and simulated modes at 633 and 1539 nm.

Keywords

II-VI semiconductors; cadmium compounds; carbon; finite difference methods; ion implantation; light propagation; optical fabrication; optical planar waveguides; optical prisms; photolithography; refractive index; wide band gap semiconductors; C ion implantation technique; CdS:C; channel waveguide structure; end-face coupling method; finite difference beam propagation method; guiding modes; near-field intensity distribution; optical properties; planar waveguide structure; prism-coupling method; refractive index profiles; standard photolithography; wavelength 1539 nm; wavelength 633 nm; Crystals; Optical device fabrication; Optical planar waveguides; Particle beam optics; Planar waveguides; Refractive index; Infrared waveguide; ion radiation; optical materials;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2014.2329060

Filename

6847662