Title :
Nanowire coating by plasma processing
Author :
Cao, Jin ; Matsoukas, Themis
Author_Institution :
Dept. of Chem. Eng., Pennsylvania State Univ., University Park, PA, USA
fDate :
4/1/2005 12:00:00 AM
Abstract :
We present a plasma-based method for the deposition of hydrogenated amorphous carbon films on metallic nanowires. Gold nanowires in mixture with silica nanospheres are introduced in a capacitively coupled radio-frequency Ar plasma where they become trapped to form a dusty plasma. Isopropanol is introduced in the plasma where it reacts to produce an amorphous film of hydrogenated carbon that deposits on the suspended nanowires and nanoparticles. The films deposited in this manner range up to about 50 nm, depending on the deposition time. Many nanowires have coatings that exhibit a high degree of fidelity, even around complex surface features such as broken and jagged edges. Film deposition on nanowires is more rapid than deposition on particles, a result that is attributed to their different charging characteristics. Observed nonuniformities in film thickness are discussed in terms of spatial distribution of the deposition rate.
Keywords :
carbon; dusty plasmas; hydrogen; nanoparticles; nanowires; plasma deposited coatings; plasma deposition; surface topography; Au; C:H; SiO2; broken edge surface; capacitively coupled radiofrequency plasma; dusty plasma; film thickness nonuniformities; gold nanowires; hydrogenated amorphous carbon films; isopropanol; jagged edge surface; metallic nanowire coating; nanoparticles; plasma deposition; plasma processing; silica nanospheres; Amorphous materials; Argon; Coatings; Dusty plasma; Gold; Nanoparticles; Plasma materials processing; Radio frequency; Silicon compounds; Surface charging; Materials processing; plasma CVD; plasma applications; thin films; vapor deposition;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2005.844505