DocumentCode
777589
Title
Nanocomposite organic films on silicon
Author
Malik, S. ; Ray, Asim K. ; Hassan, Aseel K. ; Nabok, Alexei V.
Author_Institution
Electron. Res. Group, Sheffield Hallam Univ., UK
Volume
2
Issue
3
fYear
2003
Firstpage
149
Lastpage
153
Abstract
Metal-insulator-semiconductor structures were fabricated using 40-layers-thick Langmuir-Blodgett (LB) films of stearic acid (SA) on hydrophobic n-type silicon (n-Si) substrates. Cadmium sulphide (CdS) nanoparticles were introduced by exposure to H2S gas for a period of 12 h. Samples containing CdS nanoparticles exhibit lower dc leakage current but higher effective dielectric constant. The effective dielectric constant of the CdS embedded SA matrix is found to be 5.1. The Poole-Frenkel effect is prevalent for charge transport in the LB films containing CdS nanoparticles at the field higher than 107· Vm-1. The effect becomes saturated at higher fields.
Keywords
II-VI semiconductors; Langmuir-Blodgett films; MIS structures; Poole-Frenkel effect; cadmium compounds; capacitance; leakage currents; molecular electronics; nanocomposites; nanoparticles; organic compounds; permittivity; CdS; CdS embedded SA matrix; CdS nanoparticles; H2S gas exposure; Langmuir-Blodgett films; Poole-Frenkel effect saturation; Si; capacitance; charge transport; dc leakage current; effective dielectric constant; hydrophobic n-type Si substrates; metal-insulator-semiconductor structures; nanocomposite organic films; stearic acid; Cadmium; Dielectric constant; Dielectric substrates; High-K gate dielectrics; Leakage current; Metal-insulator structures; Nanoparticles; Semiconductor films; Silicon; Virtual manufacturing;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2003.817219
Filename
1230115
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