DocumentCode :
778033
Title :
Elimination of charge-enhancement effects in GaAs FETs with a low-temperature grown GaAs buffer layer
Author :
McMorrow, Dale ; Weatherford, Todd R. ; Curtice, Walter R. ; Knudson, Alvin R. ; Buchner, Steven ; Melinger, Joseph S. ; Hu Tran, Lan ; Campbell, Arthur B.
Author_Institution :
Naval Res. Lab., Washington, DC, USA
Volume :
42
Issue :
6
fYear :
1995
fDate :
12/1/1995 12:00:00 AM
Firstpage :
1837
Lastpage :
1843
Abstract :
The use of a low temperature grown GaAs (LT GaAs) buffer layer in GaAs FETs is shown via computer simulation and experimental measurement to reduce ion-induced charge collection by two to three orders of magnitude. This reduction in collected charge is associated with the efficient reduction of charge-enhancement mechanisms in the FETs. Error rate calculations indicate that the soft error rate of LT GaAs integrated circuits will be reduced by several orders of magnitude when compared to conventional FET-based GaAs ICs
Keywords :
III-V semiconductors; Schottky gate field effect transistors; circuit analysis computing; field effect integrated circuits; gallium arsenide; insulated gate field effect transistors; ion beam effects; radiation hardening (electronics); GaAs; GaAs FETs; GaAs integrated circuits; SEU hardening; charge-enhancement effects elimination; collected charge reduction; computer simulation; enhancement mode n-channel MESFET; error rate calculations; ion-induced charge collection; low-temperature grown GaAs buffer layer; n-channel HIGFET; soft error rate; Buffer layers; Circuits; Computer simulation; Error analysis; Extraterrestrial measurements; FETs; Gallium arsenide; MESFETs; Single event upset; Space technology;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.488787
Filename :
488787
Link To Document :
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