DocumentCode :
780589
Title :
A Capacitorless 1T-DRAM on SOI Based on Dynamic Coupling and Double-Gate Operation
Author :
Bawedin, Maryline ; Cristoloveanu, Sorin ; Flandre, Denis
Author_Institution :
Dept. of Eng., Univ. of Cambridge, Cambridge
Volume :
29
Issue :
7
fYear :
2008
fDate :
7/1/2008 12:00:00 AM
Firstpage :
795
Lastpage :
798
Abstract :
The scaling requirements of conventional DRAMs lead to the recent developments of capacitorless single-transistor (1T) DRAM in SOI technology. We propose a new concept of 1T-DRAM (named MSDRAM), which is simple to fabricate, program, and read. Its basic mechanism is the metastable dip hysteresis effect, which takes advantage of the dynamic coupling between front and back interfaces in SOI transistors. Systematic measurements and simulations show that MSDRAMs are suitable for low-power applications, as they exhibit negligible off-state current and long retention time even for 50-nm devices.
Keywords :
DRAM chips; MOSFET; nanotechnology; silicon-on-insulator; MSDRAM; SOI technology; SOI transistors interfaces; capacitorless single-transistor DRAM; double-gate operation; dynamic coupling; metastable dip hysteresis effect; off-state current; size 50 nm; Current measurement; FinFETs; Hysteresis; MOSFET circuits; Metastasis; Random access memory; Semiconductor films; Time measurement; Tunneling; Voltage; 1T-DRAM; Capacitorless; FinFET; SOI; double gate; floating-body; metastable dip (MSD) effect;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2008.2000601
Filename :
4558078
Link To Document :
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