Title :
AlGaN/GaN Recessed MIS-Gate HFET With High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications
Author :
Oka, Tohru ; Nozawa, Tomohiro
Author_Institution :
Adv. Technol. Res. Labs., Sharp Corp., Nara
fDate :
7/1/2008 12:00:00 AM
Abstract :
This letter reports normally-off operation of an AlGaN/GaN recessed MIS-gate heterostructure field-effect transistor with a high threshold voltage. The GaN-based recessed MIS-gate structure in conjunction with negative polarization charges under the gate allows us to achieve the high threshold voltage, whereas the low on-state resistance is maintained by the 2-D electron gas remaining in the channel except for the recessed MIS-gate region. The fabricated device exhibits a threshold voltage as high as 5.2 V with a maximum field-effect mobility of 120 cm2/Vmiddots, a maximum drain current of over 200 mA/mm, and a breakdown voltage of 400 V.
Keywords :
III-V semiconductors; MISFET; aluminium compounds; gallium compounds; wide band gap semiconductors; 2-D electron gas; AlGaN-GaN; MIS-gate HFET; breakdown voltage; heterostructure field-effect transistor; high-threshold-voltage; maximum drain current; maximum field-effect mobility; negative polarization charges; Aluminum gallium nitride; Gallium nitride; HEMTs; MISFETs; MODFETs; Plasma applications; Plasma chemistry; Polarization; Power electronics; Threshold voltage; GaN; MIS; heterostructure field-effect transistor (HFET); normally-off; threshold voltage;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2008.2000607