DocumentCode
782014
Title
Analysis of the tuning sensitivity of silicon-on-insulator optical ring resonators
Author
Baehr-Jones, Tom ; Hochberg, Michael ; Walker, Chris ; Chan, Eric ; Koshinz, Dennis ; Krug, William ; Scherer, Axel
Author_Institution
California Inst. of Technol., Pasadena, CA, USA
Volume
23
Issue
12
fYear
2005
Firstpage
4215
Lastpage
4221
Abstract
High-quality-factor optical ring resonators have recently been fabricated in thin silicon-on-insulator (SOI). Practical applications of such devices will require careful tuning of the precise location of the resonance peaks. In particular, one often wants to maximize the resonance shift due to the presence of an active component and minimize the resonance shift due to temperature changes. This paper presents a semianalytic formalism that allows the prediction of such resonance shifts from the waveguide geometry. This paper also presents the results of experiments that show the tuning behavior of several ring resonators and find that the proposed semianalytic formalism agrees with the observed behavior.
Keywords
Q-factor; integrated optics; optical resonators; optical waveguide theory; silicon-on-insulator; Si-SiO2; high-quality-factor resonators; optical ring resonators; resonance shift; semianalytic formalism; silicon-on-insulator; tuning sensitivity; waveguide geometry; Geometrical optics; Optical refraction; Optical ring resonators; Optical sensors; Optical tuning; Optical variables control; Optical waveguides; Resonance; Silicon on insulator technology; Waveguide transitions; Integrated optics; integrated optoelectronics; optical waveguide; photothermal effects;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2005.853147
Filename
1566749
Link To Document