• DocumentCode
    782014
  • Title

    Analysis of the tuning sensitivity of silicon-on-insulator optical ring resonators

  • Author

    Baehr-Jones, Tom ; Hochberg, Michael ; Walker, Chris ; Chan, Eric ; Koshinz, Dennis ; Krug, William ; Scherer, Axel

  • Author_Institution
    California Inst. of Technol., Pasadena, CA, USA
  • Volume
    23
  • Issue
    12
  • fYear
    2005
  • Firstpage
    4215
  • Lastpage
    4221
  • Abstract
    High-quality-factor optical ring resonators have recently been fabricated in thin silicon-on-insulator (SOI). Practical applications of such devices will require careful tuning of the precise location of the resonance peaks. In particular, one often wants to maximize the resonance shift due to the presence of an active component and minimize the resonance shift due to temperature changes. This paper presents a semianalytic formalism that allows the prediction of such resonance shifts from the waveguide geometry. This paper also presents the results of experiments that show the tuning behavior of several ring resonators and find that the proposed semianalytic formalism agrees with the observed behavior.
  • Keywords
    Q-factor; integrated optics; optical resonators; optical waveguide theory; silicon-on-insulator; Si-SiO2; high-quality-factor resonators; optical ring resonators; resonance shift; semianalytic formalism; silicon-on-insulator; tuning sensitivity; waveguide geometry; Geometrical optics; Optical refraction; Optical ring resonators; Optical sensors; Optical tuning; Optical variables control; Optical waveguides; Resonance; Silicon on insulator technology; Waveguide transitions; Integrated optics; integrated optoelectronics; optical waveguide; photothermal effects;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2005.853147
  • Filename
    1566749