Inhomogeneous Ring Oscillator for Within-Die Variability and RTN Characterization

This paper discusses the concept of an inhomogeneous structure for a ring oscillator (RO) to enhance the delay effect of a particular inverter stage. The frequency of the proposed inhomogeneous structure becomes a strong function of the inhomogeneous stage; thus, the variability becomes directly visible. With careful design of the inhomogeneous stage, the RO frequency can be made sensitive to a small set of transistors for characterizing transistor-by-transistor variability. Performance sensitivities of the transistors are enhanced more than 100 times that of other transistors in the RO. The proposed ROs are embedded into a 65-nm RO-array test structure, and it is verified that these ROs are highly sensitive to within-die local variability and random telegraph noise (RTN). The within-die local variability is then successfully decomposed into threshold voltage and gate length variations. Several characteristics of RTN have been successfully extracted with the proposed structure. The proposed structure is thus very useful for observation, characterization and modeling of static and dynamic transistor variations during switching operation.