Title :
Improvement of InGaN-GaN light-emitting diode performance with a nano-roughened p-GaN surface
Author :
Huang, Hung-Wen ; Kao, C.C. ; Chu, J.T. ; Kuo, H.C. ; Wang, S.C. ; Yu, C.C.
Author_Institution :
Dept. of Photonics, Nat. Chiao Tung Univ., Hsinchu, Taiwan
fDate :
5/1/2005 12:00:00 AM
Abstract :
This investigation describes the development of InGaN-GaN light-emitting diode (LED) with a nano-roughened top p-GaN surface which uses Ni nano-mask and wet etching. The light output of the InGaN-GaN LED with a nano-roughened top p-GaN surface is 1.4 times that of a conventional LED, and wall-plug efficiency is 45% higher. The operating voltage of InGaN-GaN LED was reduced from 3.65 to 3.5 V at 20 mA and the series resistance was reduced by 20%. The light output is increased by the nano-roughening of the top p-GaN surface. The reduction in the series resistance can be attributed to the increase in the contact area of nano-roughened surface.
Keywords :
III-V semiconductors; etching; gallium compounds; indium compounds; light emitting diodes; masks; nanotechnology; surface roughness; 20 mA; 3.5 to 3.65 V; InGN-GaN light-emitting diode; InGaN-GaN; Ni nanomask; nanoroughened surface; p-GaN surface; series resistance; wall-plug efficiency; wet etching; Brightness; Gallium nitride; Light emitting diodes; Nickel; Refractive index; Rough surfaces; Surface resistance; Surface roughness; Temperature; Wet etching; Gallium nitride (GaN); light-emitting diode (LED); nano-mask; nickel;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.846741