Title :
Vertical-cavity surface-emitting lasers fabricated by vacuum integrated processing
Author :
Choquette, Kent D. ; Hasnain, G. ; Mannaerts, J.P. ; Wynn, J.D. ; Wetzel, R.C. ; Hong, M. ; Freund, R.S. ; Leibenguth, R.E.
Author_Institution :
AT&T Bell Lab., Murray Hill, NJ, USA
Abstract :
The authors report on the fabrication of vertical-cavity surface-emitting lasers (VCSELs) using vacuum processing techniques. The upper monolithic distributed Bragg reflector around the laser cavity is dry etched down to the top of the active region, followed by in situ contact deposition on the mesa sidewall, providing a short current path through the p-type mirror. These etched VCSELs exhibit lower series resistance, lower threshold voltage, greater thermal dissipation, and higher maximum output power than conventional planar VCSELs made from the same material.<>
Keywords :
laser accessories; laser cavity resonators; mirrors; optical workshop techniques; semiconductor lasers; vacuum deposition; active region; diode laser fabrication; dry etched; higher maximum output power; in situ contact deposition; laser cavity; lower series resistance; lower threshold voltage; mesa sidewall; p-type mirror; short current path; thermal dissipation; upper monolithic distributed Bragg reflector; vacuum integrated processing; vertical-cavity surface-emitting lasers; Distributed Bragg reflectors; Dry etching; Mirrors; Optical device fabrication; Power generation; Surface emitting lasers; Thermal resistance; Threshold voltage; Vacuum technology; Vertical cavity surface emitting lasers;
Journal_Title :
Photonics Technology Letters, IEEE
