Title :
A low-loss beam splitter with an optimized waveguide structure
Author :
Chung, Youngchul ; Spickermann, Ralph ; Young, D. Bruce ; Dagli, Nadir
Author_Institution :
Dept. of Electr. & Comput. Eng., California Univ., Santa Barbara, CA, USA
Abstract :
Novel beam splitters with optimized waveguide structures are designed and fabricated using reactive ion etching. At 1.15 mu m the excess loss of the beam splitter is measured to be 1.2 dB for TE and 1.8 dB for TM polarizations, respectively.<>
Keywords :
integrated optics; optical elements; optical loss measurement; optical waveguides; optical workshop techniques; sputter etching; 1.15 micron; 1.2 dB; 1.8 dB; IR; TE polarisations; TM polarizations; beam splitter design; beam splitter fabrication; excess loss; light polarisation; low-loss beam splitter; optical loss measurement; optimized waveguide structure; reactive ion etching; Design optimization; Etching; Gallium arsenide; Indium gallium arsenide; Mirrors; Optical losses; Optical scattering; Optical waveguides; Quantum well devices; Turning;
Journal_Title :
Photonics Technology Letters, IEEE
