Title :
A line extraction method for automated SEM inspection of VLSI resist
Author :
Shu, D.B. ; Li, C.C. ; Mancuso, J.F. ; Sun, Y.N.
Author_Institution :
Dept. of Electr. Eng., Pittsburgh Univ., PA, USA
fDate :
1/1/1988 12:00:00 AM
Abstract :
A precision digital edge-line-detection method is presented that was developed for extracting edge contours of resist lines of submicrometer width as imaged by scanning electron microscopy, as a means of inspection in integrated circuit fabrication. The method is based on a modification of the Hough transform
Keywords :
VLSI; automatic testing; circuit analysis computing; computer vision; computerised picture processing; inspection; integrated circuit testing; scanning electron microscopy; transforms; Hough transform; VLSI resist; automated SEM inspection; edge contours; integrated circuit fabrication; line extraction method; precision digital edge-line-detection method; scanning electron microscopy; submicrometer width; Automatic optical inspection; Electron beams; Geometrical optics; Image edge detection; Optical device fabrication; Optical microscopy; Resists; Scanning electron microscopy; Sun; Very large scale integration;
Journal_Title :
Pattern Analysis and Machine Intelligence, IEEE Transactions on
