Reflective arrayed waveguide grating multiplexer

Author

De Peralta, L. Grave ; Bernussi, A.A. ; Frisbie, S. ; Gale, R. ; Temkin, H.

Author_Institution

Dept. of Electr. & Comput. Eng., Texas Tech Univ., Lubbock, TX, USA

Volume

15

Issue

10

fYear

2003

Firstpage

1398

Lastpage

1400

Abstract

A high-performance reflective arrayed waveguide grating multiplexer/demultiplexer designed for compatibility with silicon integrated circuit processing is described. The grating, folded by a flat reflecting surface, can be printed in a single-exposure field of a photolithographic stepper. Advanced plasma assisted deposition is used to prepare waveguides with very low loss and minimum birefringence. Multiplexers with 40 channels separated by 100 GHz show intrinsic insertion losses of -2.4 dB, channel uniformity less than 0.6 dB, and very low polarization dependent wavelength shift of 0.012 nm.

Keywords

arrayed waveguide gratings; birefringence; multiplexing equipment; optical losses; optical planar waveguides; photolithography; plasma CVD; reflectivity; wavelength division multiplexing; -2.4 dB; SiO/sub 2/-Si; channel uniformity; flat reflecting surface; intrinsic insertion losses; minimum birefringence; optical planar waveguide components; phased arrays; photolithographic stepper; plasma assisted chemical vapor deposition; plasma assisted deposition; reflective arrayed waveguide grating multiplexer; silica waveguides; silicon integrated circuit processing compatibility; single-exposure field; very low loss; very low polarization dependent wavelength shift; waveguide arrays; wavelength division multiplexing; Arrayed waveguide gratings; Couplers; Multiplexing; Optical surface waves; Optical waveguides; Phased arrays; Silicon; Slabs; Surface waves; Waveguide components;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2003.818223

Filename

1232970