DocumentCode
787706
Title
Multilevel vertical-channel SONOS nonvolatile memory on SOI
Author
Lee, Yong Kyu ; Sim, Jae Sung ; Sung, Suk Kang ; Lee, Chang Ju ; Kim, Tae Hun ; Lee, Jong Duk ; Park, Byung Gook ; Lee, Dong Hun ; Kim, Young Wug
Author_Institution
Seoul National University
Volume
23
Issue
11
fYear
2002
Firstpage
664
Lastpage
666
Abstract
A first multilevel vertical-channel silicon-oxide-nitride-oxide-silicon (MLVC-SONOS) memory cell is proposed and fabricated using 0.12-μm silicon-on-insulator (SOI) standard logic process for Flash memory cell with ultrahigh density. If NAND array structure is used, the unit cell size of MLVC-SONOS is 4F2. Further reduction of cell size is possible by using the multilevel concept which is originated from the steady states by two carrier transports from both the substrate and the gate. The program threshold voltages and their windows are uniform and controllable depending on the negative gate bias conditions. In addition, we propose a new endurance measurement method for multilevels and report the retention characteristics for multilevel memory operation.
Keywords
Etching; Flash memory; Lithography; Logic; Nonvolatile memory; SONOS devices; Silicon on insulator technology; Steady-state; Stress; Virtual colonoscopy;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2002.805001
Filename
1097946
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