DocumentCode :
788029
Title :
Nanoscale Path Planning and Motion Control with Maglev Positioners
Author :
Shakir, Huzefa ; Kim, Won-jong
Author_Institution :
Dept. of Mech. Eng., Texas A&M Univ.
Volume :
11
Issue :
5
fYear :
2006
Firstpage :
625
Lastpage :
633
Abstract :
This paper addresses nanoscale path planning and motion control, which is essential in nanomanufacturing applications such as microstereolithography (muSTL), dip-pen-nanolithography (DPN), and scanning applications for imaging and manipulation of nanoscale surface phenomena, with the magnetic levitation (maglev) technology. We identified the motion trajectories commonly used in industrial applications along with the challenges in optimal path planning to meet the nanoscale motion-control objectives and achieve precise positioning and maximum throughput simultaneously. The key control parameters in path planning are determined, and control design methodologies, including a well-damped lead-lag controller and an optimal linear quadratic regulator are proposed to satisfy the positioning requirements. The proposed methodologies were implemented individually and collectively. The experimental results are presented in this paper to illustrate their effectiveness in planning optimal trajectories. The damped lead-lag controller exhibited the command overshoot values of as small as 0.37%, and the multivariable LQ controller reduced the dynamic coupling among the axes by 97.1% as compared with the decoupled single-input-single-output (SISO) lead-lag controllers. The position resolution of 5 nm was achieved in x and y with the errors in command tracking as small as 4.5 nm. The maglev stage demonstrated excellent performances for the chosen nanomanufacturing applications in terms of position resolution and accuracy, and speed
Keywords :
linear quadratic control; magnetic levitation; motion control; multivariable control systems; nanolithography; nanopositioning; path planning; stereolithography; vibration control; damped lead-lag controller; dip-pen-nanolithography; maglev positioners; magnetic levitation; microstereolithography; motion control; nanomanufacturing; nanoscale path planning; nanoscale surface phenomena; optimal multivariable linear quadratic regulator; Atomic force microscopy; Instruments; Magnetic hysteresis; Magnetic levitation; Motion control; Nanotechnology; Optimal control; Paper technology; Path planning; Trajectory; Maglev system; multivariable optimal control; nanomanipulation; nanomanufacturing; nanoscale path planning; precision positioning;
fLanguage :
English
Journal_Title :
Mechatronics, IEEE/ASME Transactions on
Publisher :
ieee
ISSN :
1083-4435
Type :
jour
DOI :
10.1109/TMECH.2006.882995
Filename :
1709868
Link To Document :
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