DocumentCode :
789019
Title :
Millimeter-wave design considerations for power amplifiers in an SiGe process technology
Author :
Pfeiffer, Ullrich R. ; Valdes-Garcia, Alberto
Author_Institution :
IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
54
Issue :
1
fYear :
2006
Firstpage :
57
Lastpage :
64
Abstract :
This paper describes a number of significant modeling considerations for SiGe heterojunction bipolar transistor power amplifiers operating at millimeter-wave frequencies. Small- and large-signal model-to-hardware correlation is presented for single transistor amplifiers, as well as for a combined dual-stage amplifier up to 65 GHz. The relevant parasitic effects are described along with the proposed modeling approach for each of them. The limits of the standard Vertical Bipolar Inter-Company device model at high-injection and their effect on the prediction of the achievable large-signal compression and power-added efficiency are also discussed.
Keywords :
Ge-Si alloys; bipolar MIMIC; integrated circuit modelling; millimetre wave power amplifiers; power integrated circuits; SiGe; combined dual-stage amplifier; heterojunction bipolar transistor; large-signal compression; large-signal model; millimeter-wave frequencies; model-to-hardware correlation; power amplifiers; power-added efficiency; single transistor amplifiers; small-signal model; Cutoff frequency; Germanium silicon alloys; Heterojunction bipolar transistors; Integrated circuit interconnections; Millimeter wave measurements; Millimeter wave technology; Millimeter wave transistors; Paper technology; Power amplifiers; Silicon germanium; Millimeter wave; model-to-hardware correlation; power amplifier (PA); silicon germanium (SiGe);
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/TMTT.2005.860898
Filename :
1573796
Link To Document :
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