Title :
Effect of ion bombardment and bias fielding for [Ni81Fe 19/Cu] multilayers with giant magnetoresistance deposited by dual ion beam sputtering
Author :
Miyamoto, Yasuyoshi ; Yoshitani, Tohru ; Nakagawa, Shigeki ; Naoe, Masahiko
Author_Institution :
Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan
fDate :
11/1/1995 12:00:00 AM
Abstract :
Ni-Fe/Cu multilayers with giant magnetoresistance (GMR) mere deposited by dual ion beam sputtering method. Simultaneous ion bombardment during the film deposition changed the crystallite orientation in GMR multilayers. The specimen films with ion-bombarded GMR multilayer and unbombarded Fe buffer layer exhibited larger MR ratio and higher field sensitivity ΔMR/ΔH. The films deposited under ion bombardment and bias fielding revealed dominant (100) orientation, and these (100)-oriented films seems to possess relatively better GMR characteristics
Keywords :
copper; crystal orientation; ferromagnetic materials; giant magnetoresistance; ion beam effects; iron alloys; magnetic multilayers; magnetoresistance; nickel alloys; sputtered coatings; Ni81Fe19-Cu; [Ni81Fe19/Cu] multilayers; bias fielding; dual ion beam sputtering; giant magnetoresistance; higher field sensitivity; ion bombardment; Buffer layers; Crystallization; Degradation; Iron; Magnetic films; Magnetic multilayers; Nonhomogeneous media; Variable structure systems; Voltage; X-ray scattering;
Journal_Title :
Magnetics, IEEE Transactions on
