Title :
Experimental 128-kbit ferroelectric memory with 1012 endurance and 10-year data retention
Author_Institution :
FRAM Design Group, Ramtron Int. Corp., Colorado Springs, CO, USA
fDate :
4/1/2002 12:00:00 AM
Abstract :
An experimental 128-kbit ferroelectric random access memory is presented, which has been designed and fabricated with 0.5 μm ferroelectric storage cell integrated CMOS technology. To achieve stable cell operation, novel design techniques, robust to unstable cell capacitors, are adopted: open bit-line cell array; up-down pulsed plate read/write-back scheme; complementary data preset reference circuitry; and non-ferroelectric reference voltage generator. A self-driven cell plate scheme has also been employed to improve cell array layout efficiency. The prototype chip incorporating these circuit schemes shows 70 ns access time and 120 ns cycle time at 3.3 V and 25°C. The read/write endurance has been confirmed up to 1012 cycles. It has also been observed that memory cells can retain the data for 10 years
Keywords :
ferroelectric capacitors; ferroelectric storage; random-access storage; 128 kbit; 25 C; 3.3 V; CMOS/TTL-compatible pinout; JEDEC standard EEPROM/SRAM pinout; cell array layout efficiency; complementary data preset reference circuitry; ferroelectric random access memory; ferroelectric storage cell integrated CMOS technology; open bit-line cell array; polarisation detection scheme; reference voltage generator; robust to unstable cell capacitors; self-driven cell plate scheme; stable cell operation; up-down pulsed plate read/write-back;
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
DOI :
10.1049/ip-cds:20020243