DocumentCode :
789952
Title :
Schottky diode with cutoff frequency of 400 GHz fabricated in 0.18 μm CMOS
Author :
Sankaran, S. ; O, K.K.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainsville, FL, USA
Volume :
41
Issue :
8
fYear :
2005
fDate :
4/14/2005 12:00:00 AM
Firstpage :
506
Lastpage :
508
Abstract :
TiSi2-Si Schottky diodes for RF rectification were fabricated using a 0.18 μm CMOS process without any process modifications. These diodes are intended to be used with forward bias and small-signal amplitude. At 0 V bias, the diodes with an area of 0.45×0.45 μm2 achieve a cutoff frequency of over 400 GHz. This is the highest cutoff frequency compared to that for the previously reported Schottky diodes fabricated in foundry CMOS processes. The turn-on voltage of the diodes is ∼0.30 V.
Keywords :
CMOS integrated circuits; Schottky diodes; silicon; titanium compounds; 0.18 micron; 0.30 V; 400 GHz; CMOS processes; RF rectification; Schottky diode; TiSi2-Si; cutoff frequency; forward bias operation; small-signal amplitude;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20050282
Filename :
1425374
Link To Document :
بازگشت