DocumentCode
789955
Title
Magnetic Properties of Amorphous Co-Zr-Pd and Co-Hf-Pd Films
Author
Takino, H. ; Tsuruoka, M. ; Hayakawa, K.
Author_Institution
Sony Corp.
Volume
3
Issue
2
fYear
1988
Firstpage
187
Lastpage
195
Abstract
The magnetic properties of amorphous Co-Zr-Pd and Co-Hf-Pd films produced by sputtering have been investigated. When the Zr or Hf content is fixed, the saturation magnetization Bs Peaks at a low Pd content, then decreases gradually. In films with a low Zr or Hf content, the saturation magnetostriction ¿s rapidly decreases with the addition of Pd. We have found that there is a wide range of compositions with both a high Bs of 15 kG, and a low ¿s of the order of 10¿7. The amorphous films with ¿s lower than +1Ã10¿6 have a high permeability ¿ after annealing in a rotating magnetic field. The crystallization temperature Tx of amorphous CO-Hf-Pd films depends on the Hf content, and the soft magnetic properties are stable up to about 50° C below Tx . Those amorphous Co-Hf-Pd films with a Bs of 15 kG and ¿s of the order of 10¿7 have been used as the main pole of single-pole type heads in perpendicular magnetic recording, yielding a high reproduced voltage and high overwrite S/N.
Keywords
Amorphous materials; Annealing; Hafnium; Magnetic films; Magnetic properties; Magnetostriction; Permeability; Saturation magnetization; Sputtering; Zirconium;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1988.4563667
Filename
4563667
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