DocumentCode
790047
Title
Bi-Substituted Garnet Films Sputtered in Ar+H2 for Magneto-Optic Memory
Author
Gomi, M. ; Okazaki, T. ; Abe, M.
Author_Institution
Tokyo Institute of Technology.
Volume
3
Issue
3
fYear
1988
fDate
3/1/1988 12:00:00 AM
Firstpage
198
Lastpage
204
Abstract
To investigate properties of Bi-substituted garnet film with many oxygen deficiencies, Bi, Ga:DyIG films were prepared by sputtering in Ar+H2 gas (H2 partial pressure 0 to 5%), and then annealed to promote crystallization. When the H2 concentration in the sputtering gas was raised, the Bi content of the film decreased. The film sputtered in Ar+H2 crystallized as a single garnet phase at relatively low temperatures (560°C for Bi = 1.5), even when the Bi content was low under non-stoichiometric conditions. The optical homogeneity of the film improved remarkably when the H2 concentration was raised; optical scattering due to crystal grain boundaries was reduced below that of film sputtered in pure Ar gas. This result is related to the many defects remaining in the crystal grains even after annealing. This was confirmed by the broad linewidths observed in X-ray diffraction studies. The magnetization and Faraday rotation hysteresis of films sputtered in Ar+H2 showed anomalies, which may have been caused by an impurity phase undetectable by X-ray diffraction measurements.
Keywords
Annealing; Bismuth; Crystallization; Garnet films; Grain boundaries; Optical films; Optical scattering; Sputtering; Temperature; X-ray diffraction;
fLanguage
English
Journal_Title
Magnetics in Japan, IEEE Translation Journal on
Publisher
ieee
ISSN
0882-4959
Type
jour
DOI
10.1109/TJMJ.1988.4563679
Filename
4563679
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