DocumentCode :
790366
Title :
Effect of RE-TM underlayer on the microstructure of TbFeCo memory layer for high-density magneto-optical recording
Author :
Murakami, Motoyoshi ; Birukawa, Masahiro
Author_Institution :
Storage Media Syst. Dev. Center, Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
Volume :
39
Issue :
5
fYear :
2003
Firstpage :
3178
Lastpage :
3180
Abstract :
A magneto-optical (MO) medium has been investigated as high-density data storage. This MO medium sputtered from an intermetallic compound alloy target has advantages for mass production. However, it may have some difficulties for advanced high-density recording due to the controllability of the magnetic properties. In order to use the mass-production advantages of this MO medium, the intrinsic magnetic properties of its film must be clarified. This paper investigates the relationship between MsHc and the magnetic underlayers, which are controlled by the film´s microstructure. It is found that the MsHc of the memory layer can be increased by controlling the first magnetic underlayer; furthermore, the arranged microcolumnar structure in the memory layer is also found to be closely related to the underlayer. As a result, as much as 1.8×106 erg/cm3 MsHc can be obtained even by sputtering from an alloy target. Adopting this film for the memory layer in a domain wall displacement detection system is promising approach for high-density recording that features reliably written tiny marks.
Keywords :
cobalt alloys; coercive force; crystal microstructure; iron alloys; magnetic recording; magneto-optical recording; sputtered coatings; terbium alloys; RE-TM underlayer; TbFeCo; TbFeCo memory layer; arranged microcolumnar structure; domain wall displacement detection system; high-density data storage; high-density magneto-optical recording; high-density recording; magnetic properties; magnetic underlayers; magneto-optical medium; microstructure; reliably written tiny marks; sputtered; Controllability; Intermetallic; Magnetic films; Magnetic properties; Magnetooptic effects; Magnetooptic recording; Mass production; Memory; Microstructure; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2003.816049
Filename :
1233337
Link To Document :
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