Title :
Segregated Microstructure in Sputtered Co-Cr Films by Selective Chemical Etching
Author :
Takahashi, M. ; Maeda, Y. ; Asahi, M.
Author_Institution :
NTT Electrical Communications Laboratories.
fDate :
7/1/1988 12:00:00 AM
Keywords :
Chemicals; Chromium; Diffraction; Internal stresses; Ionization; Magnetic films; Microstructure; Optical films; Passivation; Sputter etching;
Journal_Title :
Magnetics in Japan, IEEE Translation Journal on
DOI :
10.1109/TJMJ.1988.4563771
