Title :
Electron-cyclotron resonance etching of mirrors for ridge-guided lasers
Author :
Swanson, P.D. ; Shire, D.B. ; Tang, C.L. ; Parker, M.A. ; Kimmet, J.S. ; Michalak, R.J.
Author_Institution :
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
fDate :
6/1/1995 12:00:00 AM
Abstract :
Etched laser mirrors are important for the monolithic integration of lasers in optical circuits without cleaved facets. Electron cyclotron resonance (ECR) etching is ideal for opto-electronic fabrication since the etching parameters are independently adjustable and a variety of masking materials are available for creating multiple etch depths, e.g., for etched ridge lasers with etched mirror facets. We report on the fabrication and characterization of ECR etched laser mirrors and waveguides. The quality of the ECR etch is ascertained by measuring the reflection coefficients of 90/spl deg/ turning mirrors in GaAs-AlGaAs multiple-quantum-well (MQW) lasers incorporating multiple numbers of 90/spl deg/ bends. The average reflection coefficient is found to be approximately 80%.<>
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; laser mirrors; quantum well lasers; ridge waveguides; sputter etching; waveguide lasers; 90/spl deg/ turning mirrors; ECR etch quality; GaAs-AlGaAs; GaAs-AlGaAs multiple-quantum-well lasers; MQW lasers; average reflection coefficient; electron-cyclotron resonance etching; etched laser mirrors; etched mirror facets; etched ridge lasers; etching parameters; fabrication; masking materials; mirrors; monolithic integration; multiple etch depths; optical circuits; optoelectronic fabrication; reflection coefficients; ridge-guided lasers; Electron optics; Etching; Integrated optics; Mirrors; Monolithic integrated circuits; Optical device fabrication; Optical reflection; Quantum well devices; Resonance; Waveguide lasers;
Journal_Title :
Photonics Technology Letters, IEEE
