DocumentCode
791473
Title
The effect of nitrogen on soft magnetism in FeTaN films
Author
Inturi, V.R. ; Barnard, J.A.
Author_Institution
Dept. of Metall. & Mater. Eng., Alabama Univ., Tuscaloosa, AL, USA
Volume
31
Issue
6
fYear
1995
fDate
11/1/1995 12:00:00 AM
Firstpage
2660
Lastpage
2662
Abstract
An attempt has been made to understand and explain the relationship between soft magnetism and nitrogen content in single layer FeTaN films deposited by dc magnetron sputtering. The effect of nitrogen content on film microstructure, crystallite size, saturation magnetization, magnetostriction, and coercivity is analyzed. Clear trends emerge from this analysis. A linear relationship exists between nitrogen content and all the properties mentioned above with the exception of coercivity. The coercivity is observed to decrease suddenly on the addition of nitrogen, then remain flat over a large range of nitrogen contents, finally increasing rapidly at high nitrogen contents. Permeability and anisotropy field measurements are also reported
Keywords
coercive force; iron compounds; magnetic anisotropy; magnetic permeability; magnetic thin films; magnetisation; magnetostriction; soft magnetic materials; sputtered coatings; tantalum compounds; DC magnetron sputtering; FeTaN; FeTaN films; anisotropy; coercivity; crystallite size; magnetostriction; microstructure; nitrogen content; permeability; saturation magnetization; soft magnetism; Coercive force; Magnetic analysis; Magnetic anisotropy; Magnetostriction; Microstructure; Nitrogen; Perpendicular magnetic anisotropy; Saturation magnetization; Soft magnetic materials; Sputtering;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.490084
Filename
490084
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