• DocumentCode
    791473
  • Title

    The effect of nitrogen on soft magnetism in FeTaN films

  • Author

    Inturi, V.R. ; Barnard, J.A.

  • Author_Institution
    Dept. of Metall. & Mater. Eng., Alabama Univ., Tuscaloosa, AL, USA
  • Volume
    31
  • Issue
    6
  • fYear
    1995
  • fDate
    11/1/1995 12:00:00 AM
  • Firstpage
    2660
  • Lastpage
    2662
  • Abstract
    An attempt has been made to understand and explain the relationship between soft magnetism and nitrogen content in single layer FeTaN films deposited by dc magnetron sputtering. The effect of nitrogen content on film microstructure, crystallite size, saturation magnetization, magnetostriction, and coercivity is analyzed. Clear trends emerge from this analysis. A linear relationship exists between nitrogen content and all the properties mentioned above with the exception of coercivity. The coercivity is observed to decrease suddenly on the addition of nitrogen, then remain flat over a large range of nitrogen contents, finally increasing rapidly at high nitrogen contents. Permeability and anisotropy field measurements are also reported
  • Keywords
    coercive force; iron compounds; magnetic anisotropy; magnetic permeability; magnetic thin films; magnetisation; magnetostriction; soft magnetic materials; sputtered coatings; tantalum compounds; DC magnetron sputtering; FeTaN; FeTaN films; anisotropy; coercivity; crystallite size; magnetostriction; microstructure; nitrogen content; permeability; saturation magnetization; soft magnetism; Coercive force; Magnetic analysis; Magnetic anisotropy; Magnetostriction; Microstructure; Nitrogen; Perpendicular magnetic anisotropy; Saturation magnetization; Soft magnetic materials; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.490084
  • Filename
    490084