DocumentCode :
791494
Title :
Narrow stripe fabrication of soft magnetic materials by trench filling process
Author :
Yoda, H. ; Hori, A. ; Inoue, N. ; Sawabe, A. ; Sahashi, M.
Author_Institution :
Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
Volume :
31
Issue :
6
fYear :
1995
fDate :
11/1/1995 12:00:00 AM
Firstpage :
2666
Lastpage :
2668
Abstract :
Low-pressure collimation sputtering was applied to trench filling with soft magnetic materials. Collimation and substrate bias were found effective to fill the trenches with a uniform film. NiFe and CoZrNb were tested as soft magnetic materials, and it was found that NiFe was suitable for the process. Stripes of NiFe about two micron wide and one micron high, and with excellent morphology, were fabricated inside trenches by combining collimation sputtering with an etch-back process
Keywords :
iron alloys; magnetic thin films; nickel alloys; soft magnetic materials; sputter deposition; CoZrNb; NiFe; etch-back; film morphology; low-pressure collimation sputtering; soft magnetic materials; stripe fabrication; trench filling; Collimators; Fabrication; Filling; Magnetic films; Materials testing; Morphology; Soft magnetic materials; Sputter etching; Sputtering; Substrates;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.490086
Filename :
490086
Link To Document :
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