• DocumentCode
    791616
  • Title

    A new magnetic flux tap for saturation control in planar silicon heads

  • Author

    Lazzari, J.-P. ; Cuchet, Robert

  • Author_Institution
    SILMAG, Grenoble, France
  • Volume
    31
  • Issue
    6
  • fYear
    1995
  • fDate
    11/1/1995 12:00:00 AM
  • Firstpage
    2690
  • Lastpage
    2693
  • Abstract
    Planar Silicon Heads (PSH) have been developed in order to offer to the drive industry a modern approach to make heads which are the key component for magnetic recording. Full batch process manufacturing, higher performances and largely open development for the future drive industry are the three main characteristics of these new heads. After a long period of development, industrialization and qualification, these heads are now commercially available. The optimization of PSH improves the write capability with a small gap length. The development of a flux concentrator and its optimization comparing modelling and experimental results enabled us to make a very efficient head. This paper describes the flux concentrator and its optimization
  • Keywords
    elemental semiconductors; magnetic flux; magnetic heads; magnetic recording; silicon; Si; batch process manufacturing; flux concentrator; gap length; magnetic flux tap; magnetic recording; planar silicon heads; saturation control; write capability; Industrial control; Magnetic flux; Magnetic heads; Magnetic materials; Magnetic recording; Magnetic separation; Manufacturing industries; Saturation magnetization; Silicon; Writing;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.490094
  • Filename
    490094