DocumentCode
791616
Title
A new magnetic flux tap for saturation control in planar silicon heads
Author
Lazzari, J.-P. ; Cuchet, Robert
Author_Institution
SILMAG, Grenoble, France
Volume
31
Issue
6
fYear
1995
fDate
11/1/1995 12:00:00 AM
Firstpage
2690
Lastpage
2693
Abstract
Planar Silicon Heads (PSH) have been developed in order to offer to the drive industry a modern approach to make heads which are the key component for magnetic recording. Full batch process manufacturing, higher performances and largely open development for the future drive industry are the three main characteristics of these new heads. After a long period of development, industrialization and qualification, these heads are now commercially available. The optimization of PSH improves the write capability with a small gap length. The development of a flux concentrator and its optimization comparing modelling and experimental results enabled us to make a very efficient head. This paper describes the flux concentrator and its optimization
Keywords
elemental semiconductors; magnetic flux; magnetic heads; magnetic recording; silicon; Si; batch process manufacturing; flux concentrator; gap length; magnetic flux tap; magnetic recording; planar silicon heads; saturation control; write capability; Industrial control; Magnetic flux; Magnetic heads; Magnetic materials; Magnetic recording; Magnetic separation; Manufacturing industries; Saturation magnetization; Silicon; Writing;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/20.490094
Filename
490094
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