Title :
Microfabrication processes for high-Tc superconducting films
Author :
Tsuge, Hisanao ; Matsui, Shinji ; Takado, Norikazu
Author_Institution :
NEC Corp., Ibaraki, Japan
fDate :
12/1/1989 12:00:00 AM
Abstract :
Microfabrication processes for Y-Ba-Cu-O films have been investigated using ion-beam techniques. High-Tc superconducting lines as narrow as 0.8 μm have been fabricated from epitaxial YBa2Cu3O7-y films by Ar ion-beam etching (IBE) combined with focused ion-beam (FIB) lithography. The resulting lines, 1.3 μm wide and 2 mm long, showed a zero-resistance temperature of 81 K and a critical current density of 1.9×104 A/cm2 at 77.3 K. Maskless etching was carried out using a 130-keV Au+ FIB with a 0.1-μm-diameter beam. A 50-nm-thick film was patterned into 0.3-μm-wide lines at a dose of 5×1016 ions/cm2 . In comparison with Ar IBE, Cl2 reactive ion-beam etching exhibited an enhancement effect in sputtering yield. Ion implantation with 300-keV Si++ FIB also indicated the possibility of producing submicron patterns by selectively modifying film properties from superconductive to normal or insulating
Keywords :
barium compounds; critical current density (superconductivity); high-temperature superconductors; ion beam lithography; ion implantation; silicon; sputter etching; superconducting epitaxial layers; superconducting transition temperature; yttrium compounds; 300 keV; 77.3 K; 800 to 50 nm; 81 K; Ar ion beam etching; Au+ focused ion beam; Cl2 reactive ion beam etching; FIB; IBE; Si implantation; Y-Ba-Cu-O films; critical current density; enhancement effect; epitaxial YBa2Cu3O7-y films; focused ion beam lithography; high temperature superconductors; high-Tc superconducting films; ion-beam techniques; maskless etching; microfabrication processes; selectively modifying film properties; sputtering yield; submicron patterns; zero-resistance temperature; Argon; Critical current density; Etching; Gold; Identity-based encryption; Lithography; Superconducting epitaxial layers; Superconducting films; Temperature; Yttrium barium copper oxide;
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on