• DocumentCode
    792085
  • Title

    Soft error rate results of thin film media on glass substrates

  • Author

    Allegranza, Oletta C. ; Wu, Tony

  • Author_Institution
    Storage Syst. Div., IBM Corp., San Jose, CA, USA
  • Volume
    31
  • Issue
    6
  • fYear
    1995
  • fDate
    11/1/1995 12:00:00 AM
  • Firstpage
    2797
  • Lastpage
    2799
  • Abstract
    A study has been conducted to determine the effect on soft error rate, SER, of depositing thin film media on amorphous glass substrates. Glass substrates were precoated with several materials to facilitate heating the substrate to the temperature required to maintain the film´s characteristics and to prevent the surface contamination from reacting with the underlayer and the magnetic layer. The soft error rate was studied at a range of linear densities, varying from 85 to 125 KBpi, as a function of the precoat process, in-situ and ex-situ, and the precoating materials used, NiP, Ti, C. It was found that the soft error rate, as well as the signal to noise ratio, degraded dramatically in media that were not precoated. However, no clear distinction was found in terms of the best SER performance among the elements considered as precoats. Soft error rate results measured on glass disks were compared to data obtained on NiP/AlMg disks, both textured and polished
  • Keywords
    atomic force microscopy; errors; glass; magnetic recording noise; magnetic thin films; surface topography; AFM; C; Na2O-CaO-SiO2; NiP; SER performance; Ti; amorphous glass substrates; glass substrate precoating; linear density dependence; magnetoresistive head; media roughness; signal to noise ratio; soft error rate; substrate heating; surface contamination; thin film media; Amorphous materials; Conducting materials; Error analysis; Glass; Heating; Magnetic materials; Soft magnetic materials; Sputtering; Substrates; Transistors;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.490155
  • Filename
    490155