Influence of magnetic anisotropy distribution on interactions in Co-Cr-Ta thin films

Author

Suzuki, Hiroyuki ; Kodama, Naoki ; Bissell, Philip R. ; Chantrel, R.W.

Author_Institution

Data Storage Retrieval Syst. Div., Hitachi Ltd., Odawara, Japan

Volume

31

Issue

6

fYear

1995

fDate

11/1/1995 12:00:00 AM

Firstpage

2800

Lastpage

2802

Abstract

In-plane remanence properties of Co-Cr-Ta thin films have been previously investigated in order to quantify magnetic interaction effects parallel to, and transverse to, the transfer direction. Samples were prepared at two deposition rates of the Cr underlayer. Magnetic layers deposited on high deposition rate Cr underlayer had lower peak heights of ΔI and small coefficients of |dΔI/dH|max. These properties were investigated for magnetic layer thicknesses between 20 and 100 nm. The magnetic interactions became stronger as the magnetic anisotropy increased with the decrease of the magnetic layer thickness

Keywords

chromium alloys; cobalt alloys; ferromagnetic materials; magnetic anisotropy; magnetic hysteresis; magnetic thin films; remanence; sputtered coatings; tantalum alloys; 20 to 100 nm; Co-Cr-Ta thin films; CoCrTa-Cr; Cr underlayer; DC magnetron transfer sputtering system; Henkel plots; deposition rates; hysteresis loops; in-plane remanence properties; longitudinal magnetic properties; magnetic anisotropy distribution; magnetic interaction effects; magnetic layer thickness; peak heights; Artificial intelligence; Chromium; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Remanence; Saturation magnetization; Sputtering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.490156

Filename

490156