Title :
Is there light at the end of the road for optical lithography?
Author :
Levinson, Harry J.
Author_Institution :
Adv. Micro Devices Inc., Sunnyvale, CA, USA
fDate :
7/1/2002 12:00:00 AM
Abstract :
As optical lithography nears its physical limits, this article discusses the 2001 ITRS update to the lithography roadmap and reviews the possible next-generation lithography technologies outlined in that update.
Keywords :
integrated circuit technology; photolithography; 2001 ITRS Update; lithography roadmap; next-generation technologies; optical lithography; physical limits; Integrated circuit technology; Lithography; Nonhomogeneous media; Optical films; Optical materials; Random access memory; Reflectivity; Resists; Silicon compounds; Ultraviolet sources;
Journal_Title :
Circuits and Devices Magazine, IEEE
DOI :
10.1109/MCD.2002.1021122
