DocumentCode :
793680
Title :
Multichip assembly with flipped integrated circuits
Author :
Heinen, K. Gail ; Schroen, Walter H. ; Edwards, Darvin R. ; Wilson, Arthur M. ; Stierman, Roger J. ; Lamson, Michael A.
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
Volume :
12
Issue :
4
fYear :
1989
fDate :
12/1/1989 12:00:00 AM
Firstpage :
650
Lastpage :
657
Abstract :
A multichip module process has been developed using flipped-chip interconnection. The process uses plated copper bumps for superior thermal transport characteristics, active silicon as a substrate material for matched expansion properties, on-chip interconnection metallization that allows bumps to be placed over the active circuitry, and conventional wafer fabrication facilities for low-cost production. For successful design and fabrication of multichip assemblies, an organized methodology similar to that which has proved successful in design and assembly of single VLSI circuits was used. This approach involves: computer-aided modeling of the circuit and package for electrical, thermal, and mechanical simulation; test chips for process development and failure mechanism testing; and fabrication of actual demonstration circuits. Verification of function and reliability was then made through temperature cycle testing (-65°C to 150°C), exposure to accelerated moisture environments, and measure of heat dissipation properties. This approach and an example of its application to a multichip module that demonstrated successful performance on the first design pass are described
Keywords :
failure analysis; flip-chip devices; life testing; modules; packaging; -65 to 150 degC; Cu bump; Si active substrate; VLSI circuits; accelerated moisture environments; computer-aided modeling; demonstration circuits; electrical simulation; expansion properties; failure mechanism testing; flipped-chip interconnection; heat dissipation properties; low-cost production; mechanical simulation; multichip assembly design; multichip module process; on-chip interconnection metallization; process development; reliability; temperature cycle testing; test chips; thermal simulation; thermal transport characteristics; wafer fabrication facilities; Assembly; Circuit testing; Copper; Fabrication; Inorganic materials; Integrated circuit interconnections; Metallization; Multichip modules; Silicon; Thermal expansion;
fLanguage :
English
Journal_Title :
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher :
ieee
ISSN :
0148-6411
Type :
jour
DOI :
10.1109/33.49029
Filename :
49029
Link To Document :
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