DocumentCode
794357
Title
Spectroscopic investigations of GaAsSb/GaAs based structures for 1.3 μm VCSEL applications
Author
Blume, G. ; Hosea, T.J.C. ; Sweeney, S.J. ; Johnson, S.R. ; Wang, J.-B. ; Zhang, Y.-H.
Author_Institution
Adv. Technol. Inst., Univ. of Surrey, Guildford, UK
Volume
152
Issue
2
fYear
2005
fDate
4/8/2005 12:00:00 AM
Firstpage
110
Lastpage
117
Abstract
A spectroscopic investigation of GaAsSb/GaAs quantum well (QW) structures grown on GaAs substrates by molecular beam epitaxy is presented. Besides studying their temperature-dependent photoluminescence (PL), the low temperature PL of a series of GaAsSb/GaAs/AlGaAs structures, with varying GaAs spacer thickness is investigated. This latter study was undertaken to investigate the GaAsSb/GaAs band alignment. Blue shifts in the PL peak as a function of excitation laser intensity at a temperature of 10 K for the range of spacer thickness variation are studied. It is observed that significant blue shifting occurs only for spacers thicker than ∼2 nm. It is tentatively suggested that this is indicative of a transition from the electrons and holes being predominantly confined in the same layer (the QW) to being more strongly confined in adjacent layers, as the spacer thickness increases. The angle-dependent photomodulated reflectivity (PR) of similar samples is investigated. Here strong low energy interference oscillations (LEIO) are encountered, which tend to obscure any PR signals arising from the QW. The latter are exploited to estimate the refractive index of the layer responsible for the LEIO, and thus identify it. However, a way to avoid the LEIO is shown, by shortening the laser excitation wavelength, which results in measurable PR signals from the QW region, yielding several QW transition wavelengths.
Keywords
III-V semiconductors; gallium arsenide; gallium compounds; molecular beam epitaxial growth; optical testing; photoluminescence; quantum well lasers; reflectivity; semiconductor device testing; spectral line shift; surface emitting lasers; 1.3 micron; 10 K; GaAsSb-GaAs; GaAsSb/GaAs band alignment; GaAsSb/GaAs based structures; GaAsSb/GaAs quantum well structures; QW region; QW transition wavelengths; VCSEL applications; angle-dependent photomodulated reflectivity; blue shifting; low temperature PL; molecular beam epitaxy; spacer thickness variation; spectroscopic investigations; strong low energy interference oscillations; temperature dependent photoluminescence; varying GaAs spacer thickness;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:20055024
Filename
1425781
Link To Document