Ion-Assisted Effect on Ion-Beam Sputtered CoCr Films

CoCr films were prepared by dual ion beam sputtering on Ti-coated glass substrates. The film magnetic and crystallographic properties were investigated in relation to the ion-assisting conditions. Ion-assisted deposition with a low accelerating voltage of less than 200 V is very effective for increasing the perpendicular coercivity and decreasing the in-plane squareness; this fact implies that the initial film layer is thin. This method also promotes growth of a well-oriented columnar structure.