DocumentCode :
794767
Title :
Measurement of very low magnetostrictions in thin films
Author :
Rengarajan, S. ; Lee, B.H. ; Choe, G. ; Walser, R.M.
Author_Institution :
I/UCR Center for Magnetics, Texas Univ., Austin, TX, USA
Volume :
31
Issue :
6
fYear :
1995
fDate :
11/1/1995 12:00:00 AM
Firstpage :
3391
Lastpage :
3393
Abstract :
A highly sensitive optical interferometer with in-situ calibration was developed to measure the low-field magnetostriction of magnetic thin films using the cantilever beam technique, The high displacement resolution (0.01 Å) of this instrument permits the measurement of magnetostrictions of 10-9. First measurements on a soft CoFeSiB thin film were made to demonstrate this technique. The magnetostriction measurement resolution of 5×10 obtained is the lowest yet reported value. The dynamic range of the technique was demonstrated in measurements of a magnetostriction greater than 10-5
Keywords :
light interferometry; magnetic thin films; magnetic variables measurement; magnetostriction; soft magnetic materials; CoFeSiB; calibration; cantilever beam; displacement resolution; dynamic range; magnetic thin films; magnetostriction measurement; optical interferometer; soft CoFeSiB thin film; Calibration; Displacement measurement; Instruments; Magnetic films; Magnetostriction; Optical films; Optical interferometry; Optical sensors; Structural beams; Transistors;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.490392
Filename :
490392
Link To Document :
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