Title :
Spatial correlation of electron field emission sites with non-diamond carbon content in CVD diamond
Author :
Humphreys, V.L. ; Khachan, J.
Author_Institution :
Dept. of Plasma Phys., Sydney Univ., NSW, Australia
fDate :
6/8/1995 12:00:00 AM
Abstract :
Field-induced electron emission is obtained from 15 mm diameter CVD polycrystalline diamond films deposited on silicon wafers from a microwave discharge. These films were grown such that the percentage of non-diamond carbon is highest at the edge of the film. It was found that the majority of the emission sites also occured at the edge of the film
Keywords :
CVD coatings; diamond; electron field emission; C; CVD polycrystalline diamond films; electron field emission; microwave discharge; nondiamond carbon content; silicon wafers; spatial correlation;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19950698
