• DocumentCode
    795555
  • Title

    Xe Ion-Implanted NiFe Thin Films-Behaviors of Xenon and Magnetic Properties

  • Author

    Uematsu, K. ; Tsukahara, S. ; Iwashima, T. ; Tanoue, H.

  • Author_Institution
    Waseda University.
  • Volume
    5
  • Issue
    6
  • fYear
    1990
  • fDate
    6/1/1990 12:00:00 AM
  • Firstpage
    464
  • Lastpage
    471
  • Abstract
    Systematic experiments were performed on xenon ion implantation into permalloy films, in order to understand the effects of implantation of heavy inert ions on microstructures and magnetic properties. Xenon ion implantation always caused crystallization of the partially epitaxially grown permalloy film, so that the grain size increased. In addition, spherical bubbles were clearly observed even at low ion fluence in slightly defocused TEM images. The bubble size varied over several tens of Angstroms with the fluence. In electron diffraction patterns, a weak extra ring became visible when the fluence exceeded about 6 × 1016/cm2. Magnetization measurements showed a large decrease in Ms and Meff when the fluence increased. The origin of the decrease in magnetization is discussed in relation to xenon bubble formation; it is probably attributable to a decrease in the magnetization of permalloy alloy atoms on the bubble surface.
  • Keywords
    Crystallization; Diffraction; Electrons; Grain size; Ion implantation; Magnetic films; Magnetic properties; Magnetization; Microstructure; Xenon;
  • fLanguage
    English
  • Journal_Title
    Magnetics in Japan, IEEE Translation Journal on
  • Publisher
    ieee
  • ISSN
    0882-4959
  • Type

    jour

  • DOI
    10.1109/TJMJ.1990.4564296
  • Filename
    4564296